Form

Powder

Appearance

Whiteoroff-whitepowder

Source

Synthetic

ImpurityProfile

ImpurityA|(6R,7R)-7-[[(2Z)-2-(2-aminothiazol-4-yl)-2-(methoxyimino)acetyl]amino]-3-(methoxymethyl)-8-oxo-5-thia-1-azABIcyclo[4.2.0]oct-2-ene-2-carboxylicacid(cefpodoxime)|80210-62-4|C₁₅H₁₇N₅O₆S₂|427.46|ImpurityB|(1RS)-1-[[(1-methylethoxy)carbonyl]oxy]ethyl(6R,7R)-7-[[(2Z)-2-(2-aminothiazol-4-yl)-2-(methoxyimino)acetyl]amino]-3-methyl-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate(ADCA-analogueofcefpodoximeproxetil)||C₂₀H₂₅N₅O₈S₂|527.57|ImpurityC|(1RS)-1-[[(1-methylethoxy)carbonyl]oxy]ethyl(6R,7R)-7-[[(2Z)-2-(2-aminothiazol-4-yl)-2-(methoxyimino)acetyl]amino]-3-(methoxymethyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-3-ene-2-carboxylate(delta-2-cefpodoximeproxetil)||C₂₁H₂₇N₅O₉S₂|557.59|ImpurityD|(1RS)-1-[[(1-methylethoxy)carbonyl]oxy]ethyl(6R,7R)-7-[[(2E)-2-(2-aminothiazol-4-yl)-2-(methoxyimino)acetyl]amino]-3-(methoxymethyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate(anti-cefpodoximeproxetil)||C₂₁H₂₇N₅O₉S₂|557.59|ImpurityE|(1RS)-1-[[(1-methylethoxy)carbonyl]oxy]ethyl(6R,7R)-3-(acetoxymethyl)-7-[[(2Z)-2-(2-aminothiazol-4-yl)-2-(methoxyimino)acetyl]amino]-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate(ACA-analogueofcefpodoximeproxetil)||C₂₂H₂₇N₅O₁₀S₂|585.61|ImpurityF|(1RS)-1-[[(1-methylethoxy)carbonyl]oxy]ethyl(6R,7R)-7-[[(2Z)-2-[(2-formylamino)thiazol-4-yl)-2-(methoxyimino)acetyl]amino]-3-(methoxymethyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate(N-formylcefpodoximeproxetil)||C₂₂H₂₇N₅O₁₀S₂|585.61|ImpurityG|||||ImpurityH|mixtureofthediastereoisomersof1-[[(1-methylethoxy)carbonyl]oxy]ethyl(6R,7R)-7-[[(2Z)-2-[2-[[(2R)-2-[[(2Z)-2-(2-aminothiazol-4-yl)-2-(methoxyimino)acetyl]amino]-2-[(2R)-5-(methoxymethyl)-4-[[1-[[(1-methylethoxy)carbonyl]oxy]ethoxy]carbonyl]-3,6-dihydro-2H-1,3-thiazin-2-yl]acetyl]amino]thiazol-4-yl]-2-(methoxyimino)acetyl]amino]-3-(methoxymethyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate(cefpodoximeproxetildimer||C₄₃H₅₂N₁₀O₁₉S₄|1141.19|

WaterContent(KarlFisher)

≤3.0%

OpticalRotation

+35°to+48°

Assay

(OnDriedBasis):≥96.0%

ResidueOnIgnition

≤0.2%

HeavyMetals

≤20ppm